Electron beam decomposition of  CdCl2

Please use this identifier to cite or link to this item: http://ir.library.ui.edu.ng/handle/123456789/1678

Full metadata record

DC Field	Value	Language
dc.contributor.author	Green, M.	-
dc.contributor.author	Aidinis, C. J.	-
dc.contributor.author	Fakolujo, O. A.	-
dc.date.accessioned	2018-10-09T14:57:43Z	-
dc.date.available	2018-10-09T14:57:43Z	-
dc.date.issued	1984	-
dc.identifier.issn	0021-8979	-
dc.identifier.issn	1089-7550	-
dc.identifier.other	Journal of Applied Physics 57(2), pp. 631-633	-
dc.identifier.other	ui_art_green_electron_1984	-
dc.identifier.uri	http://ir.library.ui.edu.ng/handle/123456789/1678	-
dc.description.abstract	The e-beam stimulated reaction, CdCl2 (s)----Cd(s) + 2Cl(g), has been studied in cadmium chloride thin films between 303 and 483K using 2-keV electrons. The dose required to make 90-mm-deep holes at 483K is 3 X10-3 Ccm-2. Extrapolated dosing levels of ~6X10-5 C cm-2 are expected. The use of CdCl2 as a positive-type electron resist in a new scheme is proposed. A working model, useful for considering the e-beam stimilated decomposition energetics and mechanism, is briefly discussed.	en_US
dc.language.iso	en_US	en_US
dc.publisher	American Institute of Physics.	en_US
dc.title	Electron beam decomposition of CdCl2	en_US
dc.type	Article	en_US
Appears in Collections:	scholarly works

Files in This Item:

File	Description	Size	Format
(12)ui_art_green_electron_1984.pdf		868.68 kB	Adobe PDF	View/Open

UISpace