Please use this identifier to cite or link to this item: http://ir.library.ui.edu.ng/handle/123456789/1678
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dc.contributor.authorGreen, M.-
dc.contributor.authorAidinis, C. J.-
dc.contributor.authorFakolujo, O. A.-
dc.date.accessioned2018-10-09T14:57:43Z-
dc.date.available2018-10-09T14:57:43Z-
dc.date.issued1984-
dc.identifier.issn0021-8979-
dc.identifier.issn1089-7550-
dc.identifier.otherJournal of Applied Physics 57(2), pp. 631-633-
dc.identifier.otherui_art_green_electron_1984-
dc.identifier.urihttp://ir.library.ui.edu.ng/handle/123456789/1678-
dc.description.abstractThe e-beam stimulated reaction, CdCl2 (s)----Cd(s) + 2Cl(g), has been studied in cadmium chloride thin films between 303 and 483K using 2-keV electrons. The dose required to make 90-mm-deep holes at 483K is 3 X10-3 Ccm-2. Extrapolated dosing levels of ~6X10-5 C cm-2 are expected. The use of CdCl2 as a positive-type electron resist in a new scheme is proposed. A working model, useful for considering the e-beam stimilated decomposition energetics and mechanism, is briefly discussed.en_US
dc.language.isoen_USen_US
dc.publisherAmerican Institute of Physics.en_US
dc.titleElectron beam decomposition of CdCl2en_US
dc.typeArticleen_US
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